Description

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Principles and statues of nanoimprint lithography.- Stamp Fabrication.- stamp surface treatment.- Nanoimprint lithography resists.- Nanoimprint lithography process.- Modeling and Simulation of NIL.- Application of NIL in Light emitting Diodes.- Application of NIL in memory devices.- Application of NIL in solar cell.

About the Author

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Weimin Zhou Received a Ph.D. degree in Microelectronics and Solid-State Electronics from Shanghai Jiao Tong University, China. He is currently a Professor of Nanomaterials and Nanoelectronics in Shanghai Nanotechnology Promotion Center. His research interests cover semiconductor nanomaterials (nanowires, carbon-based, phase change material), novel semiconductor or nano devices, and nanofabrication, and lithium ion battery, etc. He has authored or coauthored more than 30 papers in scientific journals and is the holder of four patents in the micro/nano electronics area and material Engineering. Some research achievement is highlighted by Nature Nanotechnlogy magazine. He is also a reviewer for many scientific magazines, such as Appl. Phys. Lett, Nanotechnolgoy. Education: 1996.9-2000.7 Anhui polytechnic University, major in mechanical engineering 2001.9-2003.7 Harbin institute of technology, material engineering. 2004.3-2007.3 Shanghai Jiao Tong University, major in Microelectronics and Solid-State Electronics 2007.4-2009.4 Postdoctral Fellow at Shanghai Institute of Microsystem and Information Technology Work experience: 2004.3-2007.3 one -dimensional nanostructure and its application in nanodevices, Fabrication of semiconductor nanowrie/ nanotube, carbon nanotube 2007.4-2009.4 Nanoimprint lithography process and its application in light emitting diodes. 2009.4- now Associate Professor at Shanghai Nanotechnology Promotion Center Nanoimprint lithography and its application in nanodevices( biosensor, solar cell .et al )